Electron beam lithography with alignment of two layers using FOX16

Version 1.1 ∙ Published 3 years, 10 months ago

Abstract

A few important points in data conversion and mask processing of multilayered Ebeam lithography is discussed. The conversion is done using Layout Beamer software at EPFL CMi cleanroom.

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Authors

Mohammad J. Bereyhi

EPFL - LPQM

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