Electron beam lithography with alignment of two layers using FOX16

Version 1.1 ∙ Published 5 years ago

Abstract

A few important points in data conversion and mask processing of multilayered Ebeam lithography is discussed. The conversion is done using Layout Beamer software at EPFL CMi cleanroom.

Comments (0)

Authors

Mohammad J. Bereyhi

EPFL - LPQM

Citations

Statistics

2942

1526

Download publication