Electron beam lithography with alignment of two layers using FOX16

Version 1.1 ∙ Published 2 years, 8 months ago

Abstract

A few important points in data conversion and mask processing of multilayered Ebeam lithography is discussed. The conversion is done using Layout Beamer software at EPFL CMi cleanroom.

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Authors

Mohammad J. Bereyhi

EPFL - LPQM

Citations

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2009

883

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