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Electron beam lithography with alignment of two layers using FOX16

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electron beam lithography (EBL) Ebeam Alignment Layout Beamer

Abstract

A few important points in data conversion and mask processing of multilayered Ebeam lithography is discussed. The conversion is done using Layout Beamer software at EPFL CMi cleanroom.

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Authors

  1. Mohammad J. Bereyhi
    EPFL - LPQM

Information

Published 3 months, 3 weeks ago

DOI 10.5281/zenodo.3925144
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