Abstract


A few important points in data conversion and mask processing of multilayered Ebeam lithography is discussed. The conversion is done using Layout Beamer software at EPFL CMi cleanroom.

Comments (0)


Share


Authors


  1. EPFL - LPQM

Citations


DOI 10.5281/zenodo.3925144
Copy
Waiting for citation...
Copy

Statistics


Viewed
1623
Downloaded
595
Liked
1
Download publication

Article history