Electron beam lithography with alignment of two layers using FOX16
Version 1.1
Abstract
A few important points in data conversion and mask processing of multilayered Ebeam lithography is discussed. The conversion is done using Layout Beamer software at EPFL CMi cleanroom.
Information
Published 6 months, 3 weeks ago
DOI 10.5281/zenodo.3925144
450
199
Comments (0)
Log in to comment & reply