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Photo by Julien Dorsaz, EPFL - CMi

Results (5)



On the fabrication of high-surface-area and high-aspect-ratio gold nanostructures

We highlight some stability issues in high-surface-area and high-aspect ratio gold nanostructures fabricated using inorganic adhesion layers on silica substrates. We ascribe these problems to capillary and surface effects and show the use of organic silane self-assembled monolayers to improve the long-term stability of such structures.

Version
Version 1.1
Date
8 months ago
Lab
EPFL - NAM
Comments
0
Viewed
544
Downloads
180
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2

Efficient removal of ZEP ebeam resist after dry etching

Resist removal is an essential step for multi-layer lithography processes where a clean and contamination-free surface is essential to avoid shadow etching patterns from resist leftovers. We show that a short \mathrm{O_2} plasma exposure followed by a full NMP solution cycle removes the resist fully and leaves the surface contamination free.

Version
Version 1.0
Date
1 year, 1 month ago
Lab
EPFL - LPQM
Comments
0
Viewed
1608
Downloads
494
Liked
3

Critical point drying of suspended structures after wet etch

In this report I monitor a full successful cycle of critical point drying (CPD) run for drying MEMS sensors after wet release using KOH etching. The pressure and temperature of the CPD tool (Tousimis) is monitored during the process and plotted in a P-T diagram with \mathrm{CO_2} critical point. A few notes for higher yield in the drying process are mentioned in this report as well.

Version
Version 1.0
Date
2 years, 1 month ago
Lab
EPFL - LPQM
Comments
7
Viewed
1854
Downloads
635
Liked
2