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Here we will discuss our novel anisotropic wet-etching method that allows scalable fabrication of TMD metamaterials with atomic precision, combined with traditional nanolithography techniques.[1] We show that TMDs can be etched along certain crystallographic axes, such that the obtained edges are atomically sharp and exclusively zigzag-terminated. This allows us to fabricate interesting hexagonal nanostructures of predefined order and complexity, including a few nanometer thin nanoribbons and nanojunctions.

We describe the fabrication of high-stress Si$_3$N$_4$ nanobeam resonators with high aspect ratios exceeding lengths of $3.5$mm. The lowest order out-of-plane modes of these nanobeams have quality factors of $Q\geq 10^6$ with fundamental mode frequencies lying in the range of $80-500$kHz. The beams are fabricated from high-stress, $20-50$nm-thick films of Si$_3$N$_4$ deposited via LPCVD on standard silicon wafers. The beams are patterned via electron beam lithography and deep reactive ion etching. The underlying silicon is ...